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SuMMIT is the industry solution for rigorous, reproducible, powerful, and user friendly, LER/LWR and CDU analysis of SEM and other images since 2004. SuMMIT is an interactive off-line analysis package for critical dimension (CD) and line-edge/width roughness (LER/LWR) processing of SEM images. This feature-rich analysis program integrates a variety of visualization tools and numerous built-in processing algorithms into a user-friendly GUI. Going much further beyond the conventional characterization of LER as a single 3-sigma deviation number, SuMMIT provides a wealth of integrated spectral analysis and visualizations techniques. SuMMIT is also capable of performing large unattended batch tasks, allowing large volumes of data to be analyzed quickly. MetroLER
Optional Add-On Toolboxes: SuMMIT Developer's Kit: Metrology automation needs can be quite varied. Thus, the optional SuMMIT Developer's Kit, adds a scripting language capability as well as a Server mode which allows SuMMIT to actively monitor a directory for an updated SuMMIT Script file and will execute the Script when it appears. This allows the user to effectively integrate SuMMIT processing capabilities within their own programs or scripts using any programming scripting language they desire. The Developers Kit also includes access to an Image Processing Server Mode which allows SuMMIT to monitor a selected directory for new image files to appear and process those files saving the results in a batch output file.
SuMMIT Contact Analysis/2D Toolbox adds contact metrology capabilities to SuMMIT. The capabilities include autofencing for contacts and a variety of contact-specific metrics in addition to conventional LER metrics where instead of comparing the edge to a line, it is compared to some reference shape such as a circle or ellipse. Full control over the contact analysis recipe is provided through an additional tab in the SuMMIT recipe tool. The contact analysis features include an advanced contact metric window which reports individual and average values for diameter, major and minor diameters, orientation, perimeter, area, circularity, and eccentricity. In addition the the advanced contact metric window, this toolbox also provides a new contact-metric plot tool that allows the user to select both the plot type as well as the specific metric to plot. The recipe control includes mechanisms to remove systematic effects from the contact roughness, due for example to assymetry in the contact or squarish corners.
SuMMIT Stochastic LER Modeling
Toolbox adds LER modeling capabilities to SuMMIT. Load an aerial
image into SuMMIT, define the resist parameters, and SuMMIT will compute
the deprotection image including LER. At this point, SuMMIT's exhaustive
LER analysis capabilities can be applied to the modeled deprotection
image.
SuMMIT Process Window Analysis Toolbox adds process window computation capabilities to SuMMIT. This provides a convenient, high performance alternative to high-priced lithographic data analysis packages. This toolbox also easily integrates with SuMMIT batch analysis through the use of SuMMIT process-window batch files. Process-window batch input files an be easily generated simply by adding corresponding dose and focus information to each line of the batch file. When such a batch is run, additional process-window output files are created during batch excecution which can be directly loaded into the process-window analysis toolbox.
System Requirements: SuMMIT:
Purchasing SuMMIT: SuMMIT can be downloaded using the link on our support page, however, in order to install and run the program, license data is required. Please contact our sales department for a quote and delivery of a license file.
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